Medipix2 assembly (front and back masks).
The dimensions: Pixel 55, metal 25, SiN 10, 1st bumpo 20, 2nd bumpo 30 and back SiN 100 um.

1. Full front mask
2. Part front mask
3. Etching
4. Front metal
5. SiN opening
6. 1st bumpo
7. 2nd bumbo
8. Back metal and SiN opening (Full mask)
9. Back metal and SiN opening (single detector)
 

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RTA for small and large epitixail GaAs layers.
Fast RTA: increasing temperature from 0 ⁰C to 850 ⁰C is 15sec; annealing time at 850 ⁰C is 10sec; cooling from 850 ⁰C to 0 ⁰C is 30sec. This annealing is successful for small sample only (up to about 4cm²).
SLOW RTA: increasing temperature from 0 ⁰C to 800 ⁰C is 60sec and from 800 ⁰C to 850 ⁰C is 15sec; annealing time at 850 ⁰C is 10sec; cooling from 850 ⁰C to 0 ⁰C is 30sec.

1. Fast RTA
2. Slow RTA